Effect of W nucleation process on the adhesion of W/TiN/SiO2 structures for BEOL interconnects > Achievements | 글로벌 생체융합 인터페이싱 소재센터

Achievements

GBMC's research achievements.

Effect of W nucleation process on the adhesion of W/TiN/SiO2 structure…

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S. W. Lee, D. J. Kim, J. Jeon, T. S. Kim*

Applied Surface Science [Prof. Taek-Soo Kim]

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관련링크

https://www.sciencedirect.com/science/article/pii/S016943322600958X
2회 연결

이전글Knowledge-guided strain-damage image correlation for diagnosing nonlinear mechanical behavior of freely stretched ultra-thin polymer films on water surface 26.05.07
다음글Hydrogel electronic materials and microfabrication processes for soft electronic applications 26.05.07